ASML EUV 光源的极限工程
关于这个视频
Asianometry 解释了 ASML 光刻机内的 EUV 光源,其中激光两次撞击落下的锡滴,产生 13.5 nm 的光。它介绍了液滴发生器、预脉冲和主激光器以及产生的等离子体的工程设计。
HN 为什么推荐它:每当提到 EUV、ASML 或芯片制造时,评论者都会反复指出它,这是对芯片制造中最困难的工程问题之一的清晰而令人惊讶的解释。
“这段来自 Asianometry 的关于 EUV 光源的视频非常值得观看。这太不可思议了。”— HN 评论 · 2022 · 原文
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Asianometry explains the EUV light source inside ASML's lithography machines, where lasers hit falling tin droplets twice to produce 13.5 nm light. It walks through the engineering of the droplet generator, the pre-pulse and main laser, and the plasma that results.
Why HN likes it: Commenters repeatedly point to it whenever EUV, ASML or chip manufacturing comes up, as a clear and astonishing explanation of one of the hardest engineering problems in chipmaking.
“This video from Asianometry on EUV light sources is well worth the watch. It's pretty incredible.”
原视频频道:Asianometry · YouTube 69.8 万次观看











